Dynamic CE Systems
Designed to use a sealed emitter allowing for installation in a wide variety of shielded configurations
Designed to use a sealed emitter allowing for installation in a wide variety of shielded configurations.
The innovative system designs leverage sealed-emitter technology to deliver the benefits of ebeam to R&D lines, narrow web, or 3D part applications.
The Dynamic series connects a full range of ebeam capabilities with creative configuration concepts.
There are multiple options available and systems may be installed to process flexible narrow web products inline, or for batch processing of sheets or cylindrical objects for Direct To Shape (DTS) applications.
Designed to use a sealed emitter allowing for installation in a wide variety of shielded configurations.
The innovative system designs leverage sealed-emitter technology to deliver the benefits of ebeam to R&D lines, narrow web, or 3D part applications. The Dynamic series connects a full range of ebeam capabilities with creative configuration concepts.
Compact System
The EBLab200 may be installed in any laboratory or workshop environment.
The touchscreen control system supports convenient control of the system features to enable efficient processing of samples under controlled conditions.
The Ebeam parameters are easily configured for repeatable processing.
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CE System
Technical Specifications | Values |
Accelerating Voltage | 80 to 200 kV |
Maximum Uniform Beam Width | 360 mm |
Maximum Production Speed (model and voltage dependant) | 100m/min |
Maximum Surface Dose Rate for 80 kV | 30 kGy @ 100 m/min |
Cross-web Uniformity | ≤ ±10.0% variation |
Nitrogen Inerting Level | ≤ 200 ppm O2 |
Potential Dimensions (H x W x D) | 48 x 122 x 66 cm |
Facility Requirements | Electricity, cooling water, and nitrogen |
Noise Level | < 70.0 dB(A) |
Compact System
The EBLab200 may be installed in any laboratory or workshop environment.
The touchscreen control system supports convenient control of the system features to enable efficient processing of samples under controlled conditions.
The Ebeam parameters are easily configured for repeatable processing.
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